No need for masks to produce chips, another company is trying

Multibeam Corporation earlier confirmed that it has embarked on an ambitious project to use its innovative Multicolumn Electron Beam Lithography (MEBL) technology to pattern entire wafers at 45nm and advanced nodes without the use of any masks, for backend production (BEOL) processing. The contract, funded by the U.S. Department of Defense (DoD) and administered by […]